EPH - International Journal of Applied Science (ISSN: 2208-2182) 2018-06-01T06:54:14+00:00 Naeem Akhtar Open Journal Systems <p><strong><span id="cell-2-name" class="gridCellContainer"><span class="label">EPH - International Journal of Applied Science (ISSN: 2208-2182)&nbsp;</span></span></strong> publishes a wide range of high quality research articles in the field (but not limited to) given below: Biology, Physics, Chemistry, Pharmacy, Zoology, Health sciences, Agriculture and Forestry, Environmental sciences, Mathematics, Statistics, Animal Science, Bio Technology, Medical Sciences, Geology, Social Sciences, Natural sciences, Political Science, Urban Development etc.<br><span style="font-size: 1.5em;"><strong> <span style="text-shadow: #ff6600 0px 0px 3px;">Current Impact Factor: 2.496</span></strong></span></p> Porous Silicon Fabrication Process for Optical Reflectors 2018-06-01T06:54:14+00:00 Ying Yue Nian Zhen <p>We describe the use of porous silicon fabrication technique for fabricating non-manhattan structures in silicon using wet etching. The fabrication method is simple to set up, economical and produces smooth etched surface. A solid source diffusion of N++ in a P type wafer with low stress thermally grown silicon nitride is used as a masking layer. Comparison of porous silicon etches with wafers solid source diffusion and implanted diffusion is presented. The result show that areas where a solid source diffusion is used form an etch angle of 70-80°, however using an implanted diffusion the etch angle is closer to 90°. The selectivity of the etch during porous silicon fabrication using any of the above two as masking layer results in fabrication of high aspect ratio non-manhattan structures. These structures since are wet etched do not have surface roughness and can be used for optical applications.</p> 2018-05-30T09:12:18+00:00 ##submission.copyrightStatement##